Preparation of nitrogen-doped titanium oxide thin film using a PLD method as parameters of target material and nitrogen concentration ratio in nitrogen/oxygen gas mixture
Preparation of nitrogen-doped titanium oxide thin film using a PLD method as parameters of target material and nitrogen concentration ratio in nitrogen/oxygen gas mixture
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DOI：
10.1016/j.tsf.2004.07.047
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发表时间：
2005-03
期刊：
影响因子：
2.1
通讯作者：
Y. Suda;Hiroharu Kawasaki;T. Ueda;T. Ohshima
中科院分区：
文献类型：
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作者：
Y. Suda;Hiroharu Kawasaki;T. Ueda;T. Ohshima
