Laser-induced damage of 1064 nm multilayer antireflection coatings after exposure to gamma rays
Laser-induced damage of 1064 nm multilayer antireflection coatings after exposure to gamma rays
复制标题
1064nm 多层减反射涂层暴露于伽马射线后激光引起的损伤
DOI:
10.1016/j.optmat.2021.111580
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发表时间:
2021-12-06
影响因子:
3.9
通讯作者:
Shao, Jianda
中科院分区:
文献类型:
--
作者:
Wang, Zhihao;Wang, Yanzhi;Shao, Jianda
Laser coatings designed for space applications not only encounter harsh space environments, but also suffer from laser irradiation. High-energy radiation in space, such as Gamma rays, can cause defects and other damage to materials, which could contribute to laser damage induced by defect absorption. In this work, we studied the optical properties and structural composition of three groups of 1064 nm multilayer antireflection (AR) coatings irradiated by Gamma rays (345 Gy), and the effect of Gamma ray radiation on the laser-induced damage properties of thin films. Experimental results revealed that after exposure to Gamma ray, the absorption and surface roughness of the AR coating increased while the transmittance decreased. X-ray photoelectron spectroscopy (XPS) analysis confirmed that SiO2 is more fragile under Gamma radiation compared to Ta2O5 and HfO2. It was also demonstrated that the Gamma ray damage of AR coatings mainly occurred in the SiO2 layers, and consist of generation of oxygen vacancies and charging defects. The defects generated by Gamma rays increased the absorption of the laser power by the film, hence increasing the probability of laser-induced damage and reducing the laser-induced damage threshold of the film. The coatings prepared by sputtering deposition technique showed lower probability of damage by Gamma ray radiation compared to electron-beam evaporated coatings.