Preparation of dense and uniform La0.6Sr0.4Co0.2Fe0.8O3−δ (LSCF) films for fundamental studies of SOFC cathodes

Preparation of dense and uniform La0.6Sr0.4Co0.2Fe0.8O3−δ (LSCF) films for fundamental studies of SOFC cathodes
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DOI:
10.1016/j.jpowsour.2009.01.090
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发表时间:
2009-05
影响因子:
9.2
通讯作者:
Jae-Wung Lee;Ze Liu;Lei Yang;H. Abernathy;Songho Choi;Hyoun‐Ee Kim;Meilin Liu
Jae-Wung Lee;Ze Liu;Lei Yang;H. Abernathy;Songho Choi;Hyoun‐Ee Kim;Meilin Liu
中科院分区:
工程技术2区
文献类型:
--
作者:
Jae-Wung Lee;Ze Liu;Lei Yang;H. Abernathy;Songho Choi;Hyoun‐Ee Kim;Meilin Liu

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采用射频磁控溅射法,在(100)Si和GDC电解质衬底上,用单相氧化物靶制备了La0.6Sr0.4Co0.2Fe0.8O3−δ(LSCF)薄膜。系统地研究了溅射条件,包括衬底温度(23-600°C)、背景气压(1.2×10− 2 ~ 3.0×10− 2 mbar)、功率和沉积时间,以获得致密均匀的薄膜。结果表明,要获得致密、均匀、无裂纹的LSCF薄膜,最佳衬底温度为23°C,氩气压力为2.5×10− 2 mbar。此外,还在由致密LSCF膜(作为工作电极)、GDC电解质膜和多孔LSCF对电极组成的电池中测定致密LSCF膜的电化学性质。成功地制备高质量(致密和均匀)的LSCF薄膜的厚度,形貌和结晶度的控制是至关重要的固体氧化物燃料电池阴极材料的基础研究。
Thin films of La0.6Sr0.4Co0.2Fe0.8O3−δ(LSCF) were deposited on (100) silicon and on GDC electrolyte substrates by rf-magnetron sputtering using a single-phase oxide target of LSCF. The conditions for sputtering were systematically studied to get dense and uniform films, including substrate temperature (23–600°C) background pressure (1.2×10−2to 3.0×10−2mbar), power, and deposition time. Results indicate that to produce a dense, uniform, and crack-free LSCF film, the best substrate temperature is 23°C and the argon pressure is 2.5×10−2mbar. Further, the electrochemical properties of a dense LSCF film were also determined in a cell consisting of a dense LSCF film (as working electrode), a GDC electrolyte membrane, and a porous LSCF counter electrode. Successful fabrication of high quality (dense and uniform) LSCF films with control of thickness, morphology, and crystallinity is vital to fundamental studies of cathode materials for solid oxide fuel cells.