Strain-induced structural transition of rutile type ReO2 epitaxial thin films
Strain-induced structural transition of rutile type ReO2 epitaxial thin films
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DOI：
10.1063/5.0006373
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发表时间：
2020-09
影响因子：
4
通讯作者：
S. Shibata;Y. Hirose;A. Chikamatsu;E. Ikenaga;T. Hasegawa
中科院分区：
文献类型：
--
作者：
S. Shibata;Y. Hirose;A. Chikamatsu;E. Ikenaga;T. Hasegawa
在N2O气氛下，通过反应脉冲激光沉积Re金属靶，在金红石型TiO2单晶衬底上生长了金红石型（四斜金红石型和单斜畸变金红石型）ReO2外延薄膜。随着薄膜厚度的减小，ReO2薄膜发生了从单斜相到四斜相的结构相变。X射线光电子能谱和电输运测量表明，这两个阶段的金属属性高于25 K。这两个相的价带谱的明显差异可能是由于由Re 5dt2g主导的能带结构的重建。
Rutile-related (tetragonal rutile and monoclinic distorted rutile) ReO2 epitaxial thin films were grown on rutile TiO2 single crystalline substrates by reactive pulsed laser deposition of the Re metal target under a N2O atmosphere. The ReO2 film underwent structural phase transition from the monoclinic to tetragonal phase with the decreasing film thickness, driven by compressive lattice strain from the substrate. X-ray photoelectron spectroscopy and electrical transport measurements revealed that both phases had metallic properties above 25 K. The distinct difference in valence band spectra between the two phases might be due to reconstruction of the band structure dominated by Re 5d t2g.