EUV multilayer optics
EUV multilayer optics
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DOI：
10.1016/j.mee.2005.12.033
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发表时间：
2006-04-01
影响因子：
2.3
通讯作者：
Kaiser, N
中科院分区：
文献类型：
--
作者：
Feigl, T;Yulin, S;Kaiser, N
根据EUVL仪器的光学要求，在超精密抛光衬底上精确沉积高反射和横向梯度多层膜可视为当今极紫外光刻技术发展的主要挑战之一。为了满足这些要求，开发了一种新的直流磁控溅射系统Nessy和在曲面光学上镀制横向梯度EUV多层膜的技术。本文介绍了该镀膜机的主要特点和溅射多层膜光学器件的实验结果。(C)2006爱思唯尔B.V.保留所有权利。
According to the optics requirements of an EUVL tool, the accurate deposition of high reflective and laterally graded multilayers on ultraprecise polished substrates can be regarded as one of the major challenges of EUV lithography development today. To meet these requirements, a new dc magnetron sputtering system NESSY and technologies to coat laterally graded EUV multilayers on curved optics were developed. The major characteristics of the deposition tool and results of sputtered multilayer optics are presented in this paper. (c) 2006 Elsevier B.V. All rights reserved.