Van der Waals Epitaxy and Photoresponse of Hexagonal Tellurium Nanoplates on Flexible Mica Sheets
Van der Waals Epitaxy and Photoresponse of Hexagonal Tellurium Nanoplates on Flexible Mica Sheets
复制标题
柔性云母片上六方碲纳米板的范德华外延和光响应
DOI：
10.1021/nn5028104
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发表时间：
2014-07-01
期刊：
影响因子：
17.1
通讯作者：
He, Jun
中科院分区：
文献类型：
--
作者：
Wang, Qisheng;Safdar, Muhammad;He, Jun
货车德瓦尔斯外延（vdWE）由于其在二维层状材料合成中的广泛应用而引起人们极大的兴趣。然而，非层状功能材料的vdWE仍然没有很好的记录。在这里，虽然碲有一个强烈的倾向，生长成一维纳米结构，由于其链状结构，我们成功地实现了20个六角形碲纳米片上的柔性云母片通过vdWE。化学惰性的云母表面对于六方碲纳米片的横向生长是至关重要的，因为它（1）促进碲原子沿着云母表面的迁移和（2）允许大的晶格失配。此外，二维碲六边形纳米片为基础的光电探测器在柔性云母片上原位制造。器件在弯曲100次后仍能获得有效的光响应，表明云母片上20碲六方纳米片基光电探测器在柔性和可穿戴光电器件中具有很大的应用潜力。我们相信vdWE对碲六方纳米片生长的影响的基本理解可以为利用vdWE作为实现其他非层状材料的20几何形状的有用通道铺平道路。
Van der Waals epitaxy (vdWE) is of great interest due to its extensive applications in the synthesis of ultrathin two-dimensional (2D) layered materials. However, vdWE of nonlayered functional materials is still not very well documented. Here, although tellurium has a strong tendency to grow Into one-dimensional nanoarchitecture due to its chain-like structure, we successfully realize 20 hexagonal tellurium nanoplates on flexible mica sheets via vdWE. Chemically inert mica surface is found to be crucial for the lateral growth of hexagonal tellurium nanoplates since it (1) facilitates the migration of tellurium adatoms along mica surface and (2) allows a large lattice mismatch. Furthermore, 2D tellurium hexagonal nanoplates-based photodetectors are in situ fabricated on flexible mica sheets. Efficient photoresponse Is obtained even after bending the device for 100 times, indicating 20 tellurium hexagonal nanoplates-based photodetectors on mica sheets have a great application potential in flexible and wearable optoelectronic devices. We believe the fundamental understanding of vdWE effect on the growth of 20 tellurium hexagonal nanoplate can pave the way toward leveraging vdWE as a useful channel to realize the 20 geometry of other nonlayered materials.