Preparation of Apatite Thin Films through rf-Sputtering from Calcium Phosphate Glasses
Preparation of Apatite Thin Films through rf-Sputtering from Calcium Phosphate Glasses
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磷酸钙玻璃射频溅射制备磷灰石薄膜
DOI：
10.1111/j.1151-2916.1994.tb04611.x
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发表时间：
1994
影响因子：
3.9
通讯作者：
K. Ogawa
中科院分区：
文献类型：
--
作者：
K. Yamashita;T. Arashi;K. Kitagaki;S. Yamada;T. Umegaki;K. Ogawa
采用射频磁控溅射法，以Ca/P原子比为0.6 ~ 0.75的磷酸钙玻璃为靶，经退火处理，成功地制备了磷酸钙磷灰石薄膜。使用具有0.65至0.25的低Ca/P比的靶，获得磷酸三钙和焦钙薄膜。这些磷酸钙相的形成归因于溅射过程中的氧化磷损失。H2O蒸汽是有效的在高温下形成的磷灰石相，磷灰石是在环境H2O的专属相，即使当使用的目标与低Ca/P比为0.4。基于在高温下的相稳定性，据推测，各种磷灰石，如化学计量和非化学计量的羟基和钙缺乏羟基磷灰石形成，这取决于玻璃靶的组成。
Apatite thin films of calcium phosphate were successfully prepared by rf-magnetron sputtering, followed by postannealing, from calcium phosphate glass targets with Ca/P atomic ratios of 0.6 to 0.75, much lower than the stoichio-metric value of 1.67 for hydroxyapatite. Using targets with low Ca/P ratios of 0.65 to 0.25, tricalcium and pyrocalcium phosphate thin films were obtained. The formation of these calcium phosphates phases was attributed to the phosphorus oxide losses during sputtering. H2O vapor was effective in the formation of the apatite phase at high temperatures; apatite was the exclusive phase in the ambient H2O, even when the target with the low Ca/P ratio of 0.4 was used. Based on phase stability at high temperatures, it was assumed that various kinds of apatites, such as stoichiometric and nonstoichiometric hydroxy- and Ca-deficient hydroxy-apatites were formed, depending on the composition of the glass targets.