Investigation on La2Zr2O7 multilayers by chemical solution deposition
Investigation on La2Zr2O7 multilayers by chemical solution deposition
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DOI：
10.1016/j.ceramint.2017.01.014
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发表时间：
2017-04
影响因子：
5.2
通讯作者：
C. Ren;H. Suo;Min Liu;H. Tian;Liang Yaru;Yan Xu;Yi Ning
中科院分区：
文献类型：
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作者：
C. Ren;H. Suo;Min Liu;H. Tian;Liang Yaru;Yan Xu;Yi Ning
采用化学溶液沉积（CSD）技术，在% W （Ni5W）双轴织构Ni-5衬底上制备了80 nm、140 nm和200 nm的La2Zr2O7（LZO）多层膜。采用x射线衍射（XRD）、电子背散射衍射（EBSD）和俄歇电子能谱（AES）对多层膜的性能进行了研究。生长缓冲层具有明显的织构，织构成分（0°~ 10°）分别约为96.7%、98.9%和98.8%。ω扫描的半最大值全宽度（FWHM）值随着层数的增加而减小，接近于Ni5W衬底。薄膜表面致密、光滑、无裂纹，粗糙度为Ra 3-5 nm，具有足够的阻隔功能，可以防止金属离子从Ni5W衬底扩散到缓冲层。采用CSD技术沉积YBa2Cu3O7−x（YBCO）薄膜，证实了LZO多层膜的性能。
The preparation of 80 nm, 140 nm, and 200 nm La2Zr2O7(LZO) multilayers on biaxially textured Ni-5 at% W (Ni5W) substrates using chemical solution deposition (CSD) was studied. The performance of multilayers was studied by means of X-Ray Diffraction (XRD), Electron Back Scattering Diffraction (EBSD), and Auger Electron Spectrometry (AES). The as-grown buffer layers exhibit sharp texture with texture components (0°−10°) about 96.7%, 98.9%, and 98.8%, respectively. The full-width at half maximum (FWHM) values of the ω-scans decreases with the number of layers, close to that of Ni5W substrates. The films exhibit dense, smooth, crack-free surface with a roughness Ra 3–5 nm, and sufficient barrier function against metal ionic diffusion from Ni5W substrates into buffer layers. The performance of LZO multilayers was confirmed by YBa2Cu3O7−x(YBCO) films deposited by CSD technology.