High-stability quartz-crystal microbalance for investigations in surface science
High-stability quartz-crystal microbalance for investigations in surface science
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DOI：
10.1063/1.1574395
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发表时间：
2003-06-01
影响因子：
1.6
通讯作者：
Slavin, AJ
中科院分区：
文献类型：
--
作者：
Bouzidi, L;Narine, SS;Slavin, AJ
本文介绍了一种高稳定性的石英晶体微天平(QCM)，以及测量沉积和溅射过程中薄膜生长过程中质量变化的方法。与传统的QCM相比，实现了更低的噪声和更高的频率稳定度。在4 h内，在6 MHz下获得了+/-0.1 Hz的稳定度，均方根稳定度为0.03 Hz。氧的一个原子单层的吸附产生了大约5赫兹的频移，因此这种稳定性使QCM能够用于测定亚单层氧化膜的化学计量，以及高精度地测量吸附的粘附率和离子研磨速率。(C)2003年美国物理研究所。
This article describes a high-stability quartz-crystal microbalance (QCM) and the methodology for measuring the change in mass during thin-film growth in deposition and sputter processes. Much lower noise and higher-frequency stability have been achieved than with conventional QCMs. A stability of +/-0.1 Hz at 6 MHz has been obtained over 4 h, with a rms stability of 0.03 Hz. The adsorption of one atomic monolayer of oxygen produces a frequency shift of about 5 Hz, so this stability enables the QCM to be used to determine the stoichiometry of submonolayer oxide films, as well as for high-accuracy measurements of adsorbate sticking probability and ion-milling rate. (C) 2003 American Institute of Physics.