Selective-Area Fluorination of Graphene with Fluoropolymer and Laser Irradiation
Selective-Area Fluorination of Graphene with Fluoropolymer and Laser Irradiation
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DOI：
10.1021/nl300346j
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发表时间：
2012-05-01
期刊：
影响因子：
10.8
通讯作者：
Ruoff, Rodney S.
中科院分区：
文献类型：
--
作者：
Lee, Wi Hyoung;Suk, Ji Won;Ruoff, Rodney S.
我们设计了一种通过用激光照射氟聚合物覆盖的石墨烯来选择性氟化石墨烯的方法。这种含氟聚合物在激光照射下产生活性氟自由基，其与石墨烯反应，但仅在激光照射区域中。C-F键形成的动力学取决于激光功率和含氟聚合物厚度，证明了通过含氟聚合物的分解而发生聚合。氟化导致石墨烯的电阻急剧增加，同时保持碳键合网络的基本骨架结构。考虑到氟化工艺的简单性以及其允许用无毒含氟聚合物作为固体源进行图案化，该方法可以应用于在石墨烯基电子器件中产生氟化石墨烯，例如用于石墨烯的电隔离。
We have devised a method to selectively fluorinate graphene by irradiating fluoropolymer-covered graphene with a laser. This fluoropolymer produces active fluorine radicals under laser irradiation that react with graphene but only in the laser-irradiated region. The kinetics of C-F bond formation is dependent on both the laser power and fluoropolymer thickness, proving that fluorination occurs by the decomposition of the fluoropolymer. Fluorination leads to a dramatic increase in the resistance of the graphene while the basic skeletal structure of the carbon bonding network is maintained. Considering the simplicity of the fluorination process and that it allows patterning with a nontoxic fluoropolymer as a solid source, this method could find application to generate fluorinated graphene in graphene-based electronic devices such as for the electrical isolation of graphene.