Effects of deposition rate and ion bombardment on properties of a-C:H films deposited by H-assisted plasma CVD method
Effects of deposition rate and ion bombardment on properties of a-C:H films deposited by H-assisted plasma CVD method
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DOI：
10.7567/jjap.55.01aa11
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发表时间：
2015
影响因子：
1.5
通讯作者：
Xiaodong Dong;K. Koga;D. Yamashita;H. Seo;N. Itagaki;M. Shiratani;Y. Setsuhara;M. Sekine;M. Hori
中科院分区：
文献类型：
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作者：
Xiaodong Dong;K. Koga;D. Yamashita;H. Seo;N. Itagaki;M. Shiratani;Y. Setsuhara;M. Sekine;M. Hori
在我们之前的研究中，我们通过使用甲苯的等离子体 CVD 实现了在沟槽基板上形成的氢化非晶碳 (a-C:H) 薄膜的共形、亚共形和各向异性沉积剖面。为了获得有关薄膜结构的信息，我们研究了沉积速率和离子轰击对使用甲苯等离子 CVD 沉积的 a-C:H 薄膜中氢键构型和氢含量的影响。 a-C:H薄膜的结构从离子能量<75 eV的类聚合物a-C:H (PLCH)转变为离子能量≥75 eV的类金刚石a-C:H (DLCH)。 a-C:H 薄膜中的氢键构型与离子能量密切相关，而对离子通量和沉积速率的依赖性较小。 PLCH区的质量密度随着氢含量的降低而逐渐增大，DLCH区的质量密度随着氢含量的降低而急剧增大。这种差异是由于 PLCH 和 DLCH 薄膜中 C-C sp3 浓度不同造成的。
In our previous study, we realized conformal, subconformal, and anisotropic deposition profiles of hydrogenated amorphous carbon (a-C:H) films formed on trench substrates by plasma CVD using toluene. To obtain information on the film structures, we investigated the effects of deposition rate and ion bombardment on hydrogen bonding configurations and hydrogen content in the a-C:H films deposited by plasma CVD using toluene. The structure of a-C:H films transforms from polymer-like a-C:H (PLCH) for the ion energy <75 eV to diamond-like a-C:H (DLCH) for the ion energy ≥75 eV. The hydrogen bonding configurations in a-C:H films are closely related to the ion energy, whereas they are less dependent on ion flux and deposition rate. The mass density increases gradually with decreasing hydrogen content in the PLCH region, and it increases sharply with decreasing hydrogen content in the DLCH region. This difference is due to the different C–C sp3 concentration in PLCH and DLCH films.