Fabrication and Modeling of Nitride Thin-Film Encapsulation Based on Anti-Adhesion-Assisted Transfer Technique and Nitride/BCB Bilayer Wrinkling
Fabrication and Modeling of Nitride Thin-Film Encapsulation Based on Anti-Adhesion-Assisted Transfer Technique and Nitride/BCB Bilayer Wrinkling
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DOI：
10.1109/tcpmt.2016.2599838
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发表时间：
2016-09-01
影响因子：
2.2
通讯作者：
Seok, Seonho
中科院分区：
文献类型：
--
作者：
Seok, Seonho
本文研究了利用抗粘接层辅助转移技术进行的屈曲氮化物薄膜封装，以及苯并环丁烯(BCB)/氮化物双分子层由于两种附着材料的弹性特性不匹配而产生的起皱。将900 nm的氮化硅薄膜沉积在涂有疏水单层的硅载体晶片上，然后在250℃下将无图案氮化硅薄膜直接粘合到目标晶片上制备的BCB密封圈上，随着粘合和后续冷却的进行，BCB收缩产生的剪切力作用于氮化硅薄膜上。键合后，硅载体片被机械分离，BCB环内只留下氮化膜。因此，实现了自模式和自校准。有趣的是，大多数不同尺寸的氮化膜都能成功转移，即使大尺寸的氮化膜部分坍塌或高度变形。此外，还进行了有限元方法建模，以理解柔性衬底上弹性薄膜起皱的形成以及薄膜转移过程的脱粘。研究发现，弯曲基底的杨氏模量对弯曲膜的弯曲波长和最大挠度有显著影响。脱粘会对弹性膜施加较大的力，脱粘后氮化物膜的形状发生变化，需要一定的稳定时间。
This paper presents buckled nitride thin-film encapsulation using anti-adhesion layer-assisted transfer technique and benzocyclobutene (BCB)/nitride bilayer wrinkling due to elastic property mismatch between the two attached materials. A 900-nm silicon nitride film is deposited on a Si carrier wafer coated with hydrophobic monolayer, and then nonpatterned nitride film is directly bonded to BCB sealing rings prepared on a target wafer at 250 degrees C. As bonding and subsequent cooling proceed, shearing force generated by BCB shrinking is applied to the thin nitride film. After bonding, the Si carrier wafer is mechanically separated, leaving only nitride membrane inside BCB ring. Thus, self-patterning and self-alignment have been achieved. Interestingly, most different-size nitride membranes are successfully transferred even though large-size ones have partially collapsed or highly deformed. Also, finite-element method modelings have been carried out to comprehend the formation of the wrinkling of thin elastic film on compliant substrate as well as the debonding of the transfer process of the thin film. It is found that Young's modulus of compliant substrate is significant to the wavelength of the wrinkle and maximum deflection of the buckled film. The debonding may apply substantial force to the elastic film, and thus the nitride membrane needs stabilization time as its shape changes after the debonding.