Influence of excited states of a deep substitutional dopant on majority-carrier concentration in semiconductors
Influence of excited states of a deep substitutional dopant on majority-carrier concentration in semiconductors
复制标题
深取代掺杂剂的激发态对半导体中多数载流子浓度的影响
DOI:
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发表时间:
2006
期刊:
影响因子:
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通讯作者:
Hideharu Matsuura
中科院分区:
文献类型:
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作者:
Hideharu Matsuura
The density NA and energy level EA of an acceptor in a p-type wide-band-gap semiconductor e.g., SiC, GaN, and diamond are determined by a least-squares fit of the charge neutrality equation to the temperature dependence of the hole concentration p T using the Fermi-Dirac distribution function for acceptors that does not consider the influence of the excited states of the acceptor. The NA obtained this way is, however, much higher than the concentration of acceptor atoms determined by secondary ion mass spectroscopy. Because EA is far from the valence-band maximum EV and the Fermi level is between EA and EV, the influence of the excited states of the acceptor on p T should not be ignored. A distribution function including the influence of excited states, which is derived from the viewpoint of the microcanonical ensemble, not the grand canonical ensemble, leads to reliable NA and EA. The situation in n-type Te-doped Al0.6Ga0.4Sb is the same, because the Te donor level is far from the conduction-band minimum for large Al mole fraction. Finally, the excited states of a substitutional dopant with a deep energy level are found to enhance the ionization of the dopant, even though they were expected to suppress the ionization because they acted as a trap according to the distribution function derived from the viewpoint of the grand canonical ensemble.