Evaluation of Wall Chemical Effect in Hydrogen Flame
Evaluation of Wall Chemical Effect in Hydrogen Flame
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氢火焰中壁化学效应的评价
DOI：
10.1016/j.proci.2020.06.021
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发表时间：
2021
期刊：
影响因子：
--
通讯作者：
Y.,
中科院分区：
文献类型：
--
作者：
Fan;Y.;Guo;J.;Lee;M.;Iki;N.;and Suzuki;Y.,
在石英微流反应器中形成了n2稀释的H2/空气预混火焰（Uin= 533 cm/s, φ = 1），用于研究金属表面的壁面化学效应。利用平面激光诱导荧光（PLIF）和双光子吸收激光诱导荧光（TALIF）分别测量了氢火焰中OH自由基、O原子和H原子的二维分布。结果表明，这三种主要物质在氢火焰中的分布都受到壁面化学效应的显著影响。OH， O和H在inconel涂层通道中向下游移动，其浓度也低于反应性较低的石英通道。根据测量到的铬镍铁合金表面OH、O和H的分布，优化了自由基淬火模型的初始粘接系数（S0）。发现Inconel对OH、O和H的粘附系数分别为0.4 ~ 0.5、0.1 ~ 0.2和< 0.05，首次表现出不同物种的粘附系数不同。
A premixed H2/air flame with N2dilution (Uin= 533 cm/s,ϕ= 1) was formed in a quartz micro flow reactor with/without a 100-nm thick Inconel coating for the investigation of wall chemical effect of the metal surface. Two-dimensional distributions of OH radical, O atom and H atom in the hydrogen flame were measured via the planar laser induced fluorescence (PLIF) and two-photon absorption laser induced fluorescence (TALIF), respectively. It is found that the distributions of all these three main species in the hydrogen flame are significantly affected by the wall chemical effect. OH, O and H shift downstream in the Inconel-coated channel, and also their concentration becomes lower than those in the less-reactive quartz channel. Based on the measured distributions of OH, O and H over the Inconel surface, the initial sticking coefficients (S0) of the radical quenching model are optimized. It is found thatS0for Inconel are 0.4–0.5, 0.1–0.2 and < 0.05 for OH, O and H, respectively, showing different sticking coefficients for different species for the first time.