Diverse mechanisms of friction induced self-organisation into a low-friction material – An overview of WS2 tribofilm formation
Diverse mechanisms of friction induced self-organisation into a low-friction material – An overview of WS2 tribofilm formation
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DOI：
10.1016/j.triboint.2016.04.029
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发表时间：
2016-09
影响因子：
6.2
通讯作者：
F. Gustavsson;S. Jacobson
中科院分区：
文献类型：
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作者：
F. Gustavsson;S. Jacobson
在滑动接触中实现低摩擦的一个聪明的方法是使用结合了联合收割机高硬度和低剪切强度的材料。这种看似矛盾的高抗塑性变形性和低抗塑性变形性的组合只能通过将硬基底材料与薄的易剪切涂层组合来实现。一些突出的这种涂层候选物是主要钼和钨的硫化物和硒化物。本文重点介绍了二硫化钨，WS2，并探讨了许多途径，形成和再生这种低摩擦膜。初始表面涉及各种类型的涂层、材料和流体，包括不同状态的W和S，但其中没有一个包括结晶WS2。所有的形成途径导致非常相似的，纯结晶WS2摩擦膜。
A clever way to accomplish low friction in sliding contacts is to use materials that combine high hardness with low shear strength. Such seemingly paradoxical combination of high resistance and low resistance to plastic deformation can only be realized by combining a hard substrate material with a thin easy-shear coating. Some prominent such coating candidates are sulfides and selenides of mainly molybdenum and tungsten. This paper focuses on tungsten disulfide, WS2, and explores the many routes to formation and regeneration of such low-friction tribofilms. The initial surfaces involve various types of coatings, materials and fluids, including W and S in different states, but none of which include crystalline WS2. All formation routes result in remarkably similar, pure crystalline WS2tribofilms.