Hydrogen at the surface and interface of metals on Si(111)
Hydrogen at the surface and interface of metals on Si(111)
复制标题
Si(111)金属表面和界面上的氢
DOI：
10.1103/physrevb.59.13020
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发表时间：
1999
影响因子：
3.7
通讯作者：
H. Yamashita
中科院分区：
文献类型：
--
作者：
K. Fukutani;H. Iwai;Y. Murata;H. Yamashita
报道了在（Pb， Ag和Cu）/Si（111）界面形成过程中，利用1h (15n, α γ) 12c的共振核反应对氢的深度分辨测量。结果表明，在110和360 K下，Pb沉积在Si (111) 1x1−H上，形成了Pb/H/Si（111）界面。然而，在110 K下沉积Ag时，发现四分之一的H单层迁移到Ag表面，其余的H留在Ag/Si（111）界面。预吸附的H原子在360 K下通过Ag和Cu的沉积从表面解吸，表明(Ag, Cu)/H/Si（111）为亚稳结构。讨论了界面H的相对稳定性。
The depth-resolved measurement of hydrogen using the resonant nuclear reaction of 1 H (15 N, α γ) 12 C in the formation of (Pb, Ag, and Cu)/Si (111) interfaces is reported. It was found that Pb deposition on Si (111) 1× 1− H at 110 and 360 K leads to the formation of the Pb/H/Si (111) interface. Upon deposition of Ag at 110 K, however, it was found that a quarter of the monolayer of H migrates to the surface of Ag with the rest of H remaining at the Ag/Si (111) interface. The preadsorbed H atom was desorbed from the surface by deposition of Ag and Cu at 360 K, suggesting that (Ag, Cu)/H/Si (111) is a metastable structure. The relative stability of the interface H is discussed.