Amorphous fluorocarbon polymer (a-C:F) films obtained by plasma enhanced chemical vapor deposition from perfluoro-octane (C8F18) vapor I: Deposition, morphology, structural and chemical properties
Amorphous fluorocarbon polymer (a-C:F) films obtained by plasma enhanced chemical vapor deposition from perfluoro-octane (C8F18) vapor I: Deposition, morphology, structural and chemical properties
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DOI：
10.1116/1.1624284
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发表时间：
2004
期刊：
影响因子：
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通讯作者：
C. Biloiu;I. Biloiu;Y. Sakai;Y. Suda;A. Ohta
中科院分区：
文献类型：
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作者：
C. Biloiu;I. Biloiu;Y. Sakai;Y. Suda;A. Ohta
采用等离子体增强化学气相沉积技术，在13.56MHz的电容耦合反应器中，以全氟辛烷（C8 F18）为单体，制备了非晶态氟碳聚合物（a-C：F）薄膜。当单体压力为0.2 ~ 1 Torr，输入功率密度为0.15 ~ 0.85W/cm ~ 3时，最大沉积速率为300 nm/min，而10%的单体氩气稀释液的沉积速率为200 nm/min。和傅里叶变换红外光谱。结果表明，薄膜具有致密、致密的结构。薄膜的氟碳比（F/C）在1.57 ~ 1.75之间，交联度在55%~ 58%之间。膜中全氟烷基（CF2）基团的相对量为29%。红外光谱显示出与不同振动频率对应的吸收峰。
The method of obtaining amorphous fluorocarbon polymer (a-C:F) films by plasma enhanced chemical vapor deposition in a capacitively coupled, 13.56 MHz reactor, from a new monomer, namely perfluoro-octane (C8F18) vapor, is presented. For monomer pressure ranging from 0.2 to 1 Torr and input power density from 0.15 to 0.85 W/cm3, the maximum deposition rate reached 300 nm/min, while 10% monomer dilution with argon led to a deposition rate of 200 nm/min. The film surface and bulk morphologies, chemical and structural compositions were investigated using scanning electron microscopy, x-ray photoelectron spectroscopy, and Fourier transform infrared spectroscopy. It was revealed that the films have a dense and compact structure. The fluorine to carbon ratio (F/C) of the films was between 1.57 and 1.75, and the degree of cross-linking was between 55% and 58%. The relative amount of perfluoroalkyl (CF2) groups in the films was 29%. The FTIR spectra showed absorption bands corresponding to the different vibrationa...