Characterization of gap-distance dependency on field emission at nanogap between silicon cleavage surfaces by numerical calculations
Characterization of gap-distance dependency on field emission at nanogap between silicon cleavage surfaces by numerical calculations
复制标题
通过数值计算表征硅解理表面之间纳米间隙处场发射的间隙距离依赖性
DOI：
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发表时间：
2022
期刊：
影响因子：
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通讯作者：
Toshiyuki Tsuchiya
中科院分区：
文献类型：
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作者：
Yuki Akura;Masaki Shimofuri;Amit Banerjee;Jun Hirotani;Toshiyuki Tsuchiya
