Structural Changes in Silica Glass by Continuous-Wave Laser Backside Irradiation
Structural Changes in Silica Glass by Continuous-Wave Laser Backside Irradiation
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DOI：
10.1111/j.1551-2916.2010.03615.x
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发表时间：
2010-06-01
影响因子：
3.9
通讯作者：
Tokura, Hitoshi
中科院分区：
文献类型：
--
作者：
Hidai, Hirofumi;Yoshioka, Masato;Tokura, Hitoshi
我们报告了通过使用连续波激光束快速加热和淬火，石英玻璃内部物理特性发生永久性变化。激光加热增强了玻璃的吸收，并且加热点由于热辐射和传导而移动。为了触发加热，将吸收材料放置在玻璃板的背面并通过玻璃进行照射。功率为 11 W 的激光照射聚焦在吸收材料上，沿激光束诱导出一个长度长达 5.5 mm 的圆柱形修改区域，该区域以类似于 130 mm/s 的速率进行修改。研究了改性石英玻璃的特性。改性区由两层组成，内、外层直径分别约为40μm和55μm左右。通过激光加热对内部区域进行改性。假想温度估计与 1900 K 相似。由于假想温度的增加，改性玻璃的蚀刻速率和硬度增加。由于内部区域的致密化，外部区域受到拉应力的影响。在外部区域，蚀刻速率增加并且硬度降低。
We report on a permanent change in the physical properties inside silica glass by rapid heating and quenching using a continuous-wave laser beam. The absorption of the glass was enhanced by laser heating, and the heated spot moved as a result of thermal radiation and conduction. To trigger heating, an absorbent material was placed on the backside of a glass plate and irradiated through the glass. Laser illumination with a power of 11 W focused on the absorbent material induced a cylindrical modified zone along the laser beam with a length of up to 5.5 mm that was modified at a rate of similar to 130 mm/s. The characteristics of the modified silica glass were studied. The modified area consists of two layers, and the diameters of the inner and outer zones are similar to 40 and similar to 55 mu m, respectively. The inner zone was modified by laser heating. The fictive temperature is estimated to be similar to 1900 K. The etch rate and hardness of the modified glass increased owing to the increment of the fictive temperature. The outer zone was modified by tensile stress due to the densification of the inner zone. In the outer zone, the etch rate is increased and hardness is decreased.