The direct injection of liquid droplets into low pressure plasmas
The direct injection of liquid droplets into low pressure plasmas
复制标题
将液滴直接注入低压等离子体
DOI:
10.1116/1.3081965
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发表时间:
2009
期刊:
影响因子:
--
通讯作者:
L. Overzet
中科院分区:
文献类型:
--
作者:
D. Ogawa;I. Saraf;A. Sra;R. Timmons;M. Goeckner;L. Overzet
A much greater number of useful precursors for plasma-enhanced chemical vapor deposition (PECVD) can be dispersed in high vapor pressure solvents than can be put into the vapor phase directly. In order to enable the use of such precursors, the authors investigated a method by which one can directly inject these liquids as microdroplets into low pressure PECVD environments. The solvent evaporates first leaving behind the desired precursor in the gas/plasma. The plasma dissociates the vapor and causes the deposition of a composite film (from precursor, solvent, and plasma gas). The authors made preliminary tests using Fe nanoparticles in hexane and were able to incorporate over 4% Fe in the resulting thin films. In addition, the authors simulated the process. The time required for a droplet to fully evaporate is a function of the background pressure, initial liquid temperature, droplet-vapor interactions, and initial droplet size. A typical evaporation time for a 50μm diameter droplet of hexane is ∼3s witho...