The direct injection of liquid droplets into low pressure plasmas

The direct injection of liquid droplets into low pressure plasmas
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将液滴直接注入低压等离子体

DOI:
10.1116/1.3081965
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发表时间:
2009
期刊:
Journal of Vacuum Science and Technology
影响因子:
--
通讯作者:
L. Overzet
L. Overzet
中科院分区:
--
文献类型:
--
作者:
D. Ogawa;I. Saraf;A. Sra;R. Timmons;M. Goeckner;L. Overzet

文献摘要

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用于等离子体增强化学气相沉积(PECVD)的有用前体的数量可以比可以直接放入气相中的多得多地分散在高蒸气压溶剂中。为了能够使用这种前体,作者研究了一种方法,通过该方法可以将这些液体作为微滴直接注入低压PECVD环境中。溶剂首先蒸发,在气体/等离子体中留下所需的前体。等离子体使蒸气离解并导致复合膜的沉积(由前体、溶剂和等离子体气体)。作者使用己烷中的Fe纳米颗粒进行了初步测试,并能够在所得薄膜中掺入超过4%的Fe。此外,作者模拟了这一过程。液滴完全蒸发所需的时间是背景压力、初始液体温度、液滴-蒸气相互作用和初始液滴尺寸的函数。对于直径为50μm的正己烷液滴,典型的蒸发时间为1.3s,而不需要...
A much greater number of useful precursors for plasma-enhanced chemical vapor deposition (PECVD) can be dispersed in high vapor pressure solvents than can be put into the vapor phase directly. In order to enable the use of such precursors, the authors investigated a method by which one can directly inject these liquids as microdroplets into low pressure PECVD environments. The solvent evaporates first leaving behind the desired precursor in the gas/plasma. The plasma dissociates the vapor and causes the deposition of a composite film (from precursor, solvent, and plasma gas). The authors made preliminary tests using Fe nanoparticles in hexane and were able to incorporate over 4% Fe in the resulting thin films. In addition, the authors simulated the process. The time required for a droplet to fully evaporate is a function of the background pressure, initial liquid temperature, droplet-vapor interactions, and initial droplet size. A typical evaporation time for a 50μm diameter droplet of hexane is ∼3s witho...