Formation and gas barrier characteristics of polysilazane-derived silica coatings formed by photoirradiation on organic films

Formation and gas barrier characteristics of polysilazane-derived silica coatings formed by photoirradiation on organic films
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有机薄膜光辐照聚硅氮烷二氧化硅涂层的形成及阻气特性

DOI:
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发表时间:
2019
期刊:
影响因子:
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通讯作者:
T. Ohishi
T. Ohishi
中科院分区:
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文献类型:
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作者:
S. Isono;T. Ohishi

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