Controlling the density of hydrothermally grown rutile TiO2 nanorods on anatase TiO2 films

Controlling the density of hydrothermally grown rutile TiO2 nanorods on anatase TiO2 films
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DOI:
10.1016/j.surfin.2019.02.010
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发表时间:
2019-06
影响因子:
6.2
通讯作者:
J. Kalb;Alena Folger;Eugen Zimmermann;Melanie Gerigk;B. Trepka;C. Scheu;S. Polarz;L. Schmidt‐Mende
J. Kalb;Alena Folger;Eugen Zimmermann;Melanie Gerigk;B. Trepka;C. Scheu;S. Polarz;L. Schmidt‐Mende
中科院分区:
材料科学2区
文献类型:
--
作者:
J. Kalb;Alena Folger;Eugen Zimmermann;Melanie Gerigk;B. Trepka;C. Scheu;S. Polarz;L. Schmidt‐Mende

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由于其界面特性,锐钛矿膜和水热生长金红石tio2纳米棒的化合物是有价值的(光电)电子应用材料。到目前为止,密集的纳米棒阵列通常生长在种子上,如多晶金红石TiO2,氟掺杂氧化锡(FTO)或分散的种子颗粒,随后添加锐钛矿改性。在现有锐钛矿薄膜上生长的纳米棒通常具有较差的附着力。在这项研究中,我们展示了锐钛矿薄膜的制备,直接作为水热生长的种子层。所述化合物在两种tio2修饰物和衬底之间具有很强的粘附性,甚至可以抵抗广泛的超声。到目前为止,纳米棒的密度是由盐酸浓度控制的,盐酸浓度也会影响纳米棒的大小和形状。我们控制纳米棒的密度与锐钛矿膜的平均晶粒尺寸,而不影响其尺寸和形状。这为特定锐钛矿/金红石化合物提供了新的科学见解和应用。锐钛矿薄膜的晶粒尺寸随薄膜沉积后退火温度的变化而变化。为了满足不同的应用需求,我们采用溅射沉积、喷雾热解、大气空间原子层沉积(SALD)等不同的沉积技术,提供适合的锐钛矿种子层。
Due to their interface properties, compounds of anatase membranes and hydrothermally grown rutile TiO2nanorods are valuable materials for (opto-) electronic applications. So far, dense nanorod arrays are typically grown on seeds such as polycrystalline rutile TiO2, fluorine-doped tin oxide (FTO) or seed particles in dispersion and the anatase modification is added subsequently. Nanorods grown on existing anatase films usually suffer from poor adhesion. In this study, we demonstrate the fabrication of anatase films that act directly as seed layers for the hydrothermal growth. The presented compounds offer a strong adhesion between the two TiO2modifications and the substrate which resists even extensive sonication. So far, the density of nanorods is controlled with the HCl concentration, which affects also their size and shape. We control the density of nanorods with the average grain size of the anatase film without affecting their size and shape. This offers new scientific insights and applications of specific anatase/rutile compounds. The grain size of the anatase films is adjusted with the post-annealing temperature after film deposition. To satisfy the requirements of different applications, we provide suitable anatase seed layers with different deposition techniques such as sputter deposition, spray pyrolysis, and atmospheric spatial atomic layer deposition (SALD).