A 36-V 49% Efficient Hybrid Charge Pump in Nanometer-Scale Bulk CMOS Technology
A 36-V 49% Efficient Hybrid Charge Pump in Nanometer-Scale Bulk CMOS Technology
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A%2036-V%2049%%20效率%20混合%20充电%20泵%20英寸%20纳米级%20散装%20CMOS%20技术
DOI:
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发表时间:
2017
影响因子:
5.4
通讯作者:
C. Yang
中科院分区:
文献类型:
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作者:
Yousr Ismail;Haechang Lee;S. Pamarti;C. Yang
This paper introduces a hybrid charge pump (HCP) architecture. The HCP enables high-voltage dc outputs in a nanometer-scale CMOS technology at improved power efficiency by optimally mixing different charge pump (CP) types that trade off voltage range and power efficiency. Conventional CP outputs in a bulk CMOS process are limited to a single-diode breakdown voltage (<inline-formula> <tex-math notation="LaTeX">$sim 12$ </tex-math></inline-formula> V in a 65-nm technology node). To support >12 V outputs, the HCP extends the voltage tolerance of bulk CMOS substrates via two technology methods: double-diode substrate isolation and field oxide isolation. To enable these isolation methods, two specialized CP cells are devised: an all-nMOS voltage doubler and an improved-drive Dickson-type pump. Two HCP design examples with opposite voltage polarities are implemented in a 65-nm CMOS technology, and their measurement results are discussed. The positive voltage HCP achieves a 36 V output and 49% peak efficiency at a 20-<inline-formula> <tex-math notation="LaTeX">$mu ext{A}$ </tex-math></inline-formula> load current and occupies 0.18 mm<inline-formula> <tex-math notation="LaTeX">$^{mathrm {mathbf {2}}}$ </tex-math></inline-formula> in area. This output voltage represents a <inline-formula> <tex-math notation="LaTeX">$3 imes $ </tex-math></inline-formula> increase in the technology’s voltage range compared to ranges attainable by conventional designs.