Soft lithographic methods for nano-fabrication
Soft lithographic methods for nano-fabrication
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DOI：
10.1039/a700145b
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发表时间：
1997-07-01
影响因子：
--
通讯作者：
Whitesides, GM
中科院分区：
文献类型：
--
作者：
Zhao, XM;Xia, YN;Whitesides, GM
软光刻技术是一种低成本、非光刻技术，用于微纳米加工。这种非传统的方法包括基于有机分子和聚合物材料的自组装和复制成型的技术。四种这样的技术，微接触印刷（mu CP），复制模塑毛细血管微模塑（MIMIC）和微转移模塑（mu TM），已经被证明可以制造尺寸大于或等于30纳米的各种材料的图案和结构。本文综述了这些技术及其在亚100纳米尺度的制备和制造中的应用。
Soft lithography is a low-cost, non-photolithographic strategy for carrying out micro- and nano-fabrication. This unconventional approach consists of techniques based on self-assembly and replica molding of organic molecules and polymeric materials. Four such techniques, microcontact printing (mu CP), replica molding micromolding in capillaries (MIMIC), and microtransfer molding (mu TM), have been demonstrated for the fabrication of patterns and structures of a variety of materials with dimension greater than or equal to 30 nm. This review describes these techniques and their applications in fabrication and manufacturing at the sub-100 nm scale.