Fabrication of Deep-Ultraviolet-Light-Source Tube Using Si-Doped AlGaN

Fabrication of Deep-Ultraviolet-Light-Source Tube Using Si-Doped AlGaN
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DOI:
10.1143/apex.4.042103
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发表时间:
2011-03
影响因子:
2.3
通讯作者:
Yuki Shimahara;H. Miyake;K. Hiramatsu;F. Fukuyo;Tomoyuki Okada;Hidetsugu Takaoka;H. Yoshida
Yuki Shimahara;H. Miyake;K. Hiramatsu;F. Fukuyo;Tomoyuki Okada;Hidetsugu Takaoka;H. Yoshida
中科院分区:
物理与天体物理3区
文献类型:
--
作者:
Yuki Shimahara;H. Miyake;K. Hiramatsu;F. Fukuyo;Tomoyuki Okada;Hidetsugu Takaoka;H. Yoshida

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制作了一种使用Si掺杂AlGaN膜作为电子束激发靶的紫外(UV)光源管。采用低压金属有机物气相外延(LP-MOVPE)方法在AlN/蓝宝石衬底上生长了Si掺杂AlGaN,并通过10 kV电子束(EB)激发对其光学性能进行了评价。通过Si掺杂和生长条件的优化,发光强度得到显著提高。从灯管中观察到247 nm深紫外光,在10 kV的EB加速电压和100 µA的电流下,灯管的寿命约为2000 h,直到初始强度的50%发射输出。
An ultraviolet (UV)-light-source tube using a Si-doped AlGaN film as a target of electron beam excitation was fabricated. The Si-doped AlGaN was grown on an AlN/sapphire substrate by low-pressure metalorganic vapor phase epitaxy (LP-MOVPE), and its optical properties were evaluated by excitation with a 10 kV electron beam (EB). Emission intensity was significantly improved by Si doping and optimization of the growth conditions. 247 nm deep-UV light was observed from the tube, and the lifetime of the light tube until 50% emission output of the initial strength was approximately 2000 h at an EB acceleration voltage of 10 kV with a current of 100 µA.