Fabrication of Deep-Ultraviolet-Light-Source Tube Using Si-Doped AlGaN
Fabrication of Deep-Ultraviolet-Light-Source Tube Using Si-Doped AlGaN
复制标题
DOI:
10.1143/apex.4.042103
复制
发表时间:
2011-03
影响因子:
2.3
通讯作者:
Yuki Shimahara;H. Miyake;K. Hiramatsu;F. Fukuyo;Tomoyuki Okada;Hidetsugu Takaoka;H. Yoshida
中科院分区:
文献类型:
--
作者:
Yuki Shimahara;H. Miyake;K. Hiramatsu;F. Fukuyo;Tomoyuki Okada;Hidetsugu Takaoka;H. Yoshida
An ultraviolet (UV)-light-source tube using a Si-doped AlGaN film as a target of electron beam excitation was fabricated. The Si-doped AlGaN was grown on an AlN/sapphire substrate by low-pressure metalorganic vapor phase epitaxy (LP-MOVPE), and its optical properties were evaluated by excitation with a 10 kV electron beam (EB). Emission intensity was significantly improved by Si doping and optimization of the growth conditions. 247 nm deep-UV light was observed from the tube, and the lifetime of the light tube until 50% emission output of the initial strength was approximately 2000 h at an EB acceleration voltage of 10 kV with a current of 100 µA.