Fabrication of 3-dimensionally shaped Si diaphragm dynamic focusing mirror

Fabrication of 3-dimensionally shaped Si diaphragm dynamic focusing mirror
复制标题

三维形状硅光阑动态聚焦镜的制作

DOI:
10.1109/memsys.1993.296946
复制
发表时间:
1993
期刊:
[1993] Proceedings IEEE Micro Electro Mechanical Systems
影响因子:
--
通讯作者:
Tadashi Hattori
Tadashi Hattori
中科院分区:
--
文献类型:
--
作者:
Michio Hisanaga;Tslikasa Koumura;Tadashi Hattori

文献摘要

被引文献

相似文献

为了获得光学理想或抛物线形变的动态聚焦镜,采用独特的加工方法制作了具有三维比厚度分布的薄硅膜片。通过有限元方法确定了允许光学理想变形的特定厚度分布。镜面直径约10毫米,厚度约9微米。其特定的镜面轮廓是通过干蚀刻法产生的。硅衬底上的光致抗蚀剂首先通过抖动方法制成的掩模暴露于特定的能量分布。然后,光致抗蚀剂被显影以形成符合光能分布的特定曲线轮廓。通过在Cf/sub4//O/sub2/等离子体中干法刻蚀,将曲线轮廓转录到硅衬底上。加工后的三维轮廓与设计相匹配,偏差小于2%。
To obtain a dynamic focusing mirror with optically ideal or parabolic deformation, a thin Si diaphragm with a 3-D specific thickness profile has been fabricated by a unique processing method. The specific thickness profile which allows optically ideal deformation is determined by the finite-element method (FEM). The mirror is approximately 10 mm in diameter and 9- mu m in thickness. Its specific profile of the mirror is created by a dry-etching method. Photoresist on a Si substrate is first exposed to a specific energy profile through a mask made by the dither method. The photoresist is then developed to form a specific curved profile which complies with the optical energy profile. The curved profile is transcribed to the Si substrate by dry etching in CF/sub 4//O/sub 2/ plasma. The processed 3-D profile matches the design with less than 2% deviation.<<ETX>>