In situ self-assembly of mild chemical reduction graphene for three-dimensional architectures

In situ self-assembly of mild chemical reduction graphene for three-dimensional architectures
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DOI:
10.1039/c1nr10355e
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发表时间:
2011-01-01
期刊:
影响因子:
6.7
通讯作者:
Yan, Lifeng
Yan, Lifeng
中科院分区:
材料科学2区
文献类型:
--
作者:
Chen, Wufeng;Yan, Lifeng

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石墨烯的三维(3D)结构在电子、催化装置和传感器中的应用很有意义。然而,在温和条件下制备宏观的全石墨烯三维结构仍然是一个挑战。本研究开发了一种简单的制备石墨烯3D结构的方法,即在95摄氏度的大气压力下,在不搅拌的情况下,通过温和的化学还原制备的石墨烯进行原位自组装。不需要化学或物理交联剂或高压。还原剂包括NaHSO3、Na2S、维生素C、HI和对苯二酚。这种方法既可以制备石墨烯水凝胶,也可以制备气凝胶,并且可以通过改变反应器的类型来控制三维结构的形状。石墨烯的3D结构具有低密度、高机械性能、热稳定性、高导电性和高比电容等特点,这使其成为超级电容器、储氢和催化剂载体的潜在应用对象。
Three-dimensional (3D) architectures of graphene are of interest in applications in electronics, catalysis devices, and sensors. However, it is still a challenge to fabricate macroscopic all-graphene 3D architectures under mild conditions. Here, a simple method for the preparation of 3D architectures of graphene is developed via the in situ self-assembly of graphene prepared by mild chemical reduction at 95 degrees C under atmospheric pressure without stirring. No chemical or physical cross-linkers or high pressures are required. The reducing agents include NaHSO3, Na2S, Vitamin C, HI, and hydroquinone. Both graphene hydrogels and aerogels can be prepared by this method, and the shapes of the 3D architectures can be controlled by changing the type of reactor. The 3D architectures of graphene have low densities, high mechanical properties, thermal stability, high electrical conductivity, and high specific capacitance, which make them candidates for potential applications in supercapacitors, hydrogen storage and as supports for catalysts.