Molecular-beam epitaxy of GaNAsBi layer for temperature-insensitive wavelength emission
Molecular-beam epitaxy of GaNAsBi layer for temperature-insensitive wavelength emission
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DOI:
10.1016/j.jcrysgro.2006.11.118
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发表时间:
2007-04
影响因子:
1.8
通讯作者:
M. Yoshimoto;Wei Huang;G. Feng;Yoshinori Tanaka;K. Oe
中科院分区:
文献类型:
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作者:
M. Yoshimoto;Wei Huang;G. Feng;Yoshinori Tanaka;K. Oe