Long-range surface polaritons in ultra-thin films of silicon
Long-range surface polaritons in ultra-thin films of silicon
复制标题
DOI：
10.1364/oe.16.019674
复制
发表时间：
2008-11-24
期刊：
影响因子：
3.8
通讯作者：
Rivas, J. Gomez
中科院分区：
文献类型：
--
作者：
Giannini, V.;Zhang, Y.;Rivas, J. Gomez
我们对非晶硅 (a-Si) 薄层支持的长程表面极化子的光激发进行了实验和理论研究。非晶硅在可见光和紫外 (UV) 频率下介电常数的较大虚部允许激发类似于金属上的长程表面等离子体激元的表面极化激元模式。这些模式沿着相当长的距离传播是可能的，因为电场很大程度上被吸收薄膜排除。我们表明，通过减少硅层的厚度，这些激发可以扩展到紫外频率，从而为与标准硅技术兼容的表面极化子紫外光学器件提供了可能性。 (c) 2008 年美国光学学会
We present an experimental and theoretical study of the optical excitation of long-range surface polaritons supported by thin layers of amorphous silicon (a-Si). The large imaginary part of the dielectric constant of a-Si at visible and ultraviolet (UV) frequencies allows the excitation of surface polariton modes similar to long-range surface plasmon polaritons on metals. Propagation of these modes along considerable distances is possible because the electric field is largely excluded from the absorbing thin film. We show that by decreasing the thickness of the Si layer these excitations can be extended up to UV frequencies, opening the possibility to surface polariton UV optics compatible with standard Si technology. (c) 2008 Optical Society of America