New instrumentation in Argonne`s HVEM-Tamdem Facility: Expanded capability for in situ ion beam studies
New instrumentation in Argonne`s HVEM-Tamdem Facility: Expanded capability for in situ ion beam studies
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阿贡国家实验室 HVEM-Tamdem 设施的新仪器：扩展了原位离子束研究的能力
DOI：
10.1557/proc-396-641
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发表时间：
1995
期刊：
影响因子：
--
通讯作者：
E. Ryan
中科院分区：
文献类型：
--
作者：
C. Allen;L. Funk;E. Ryan
1995年期间，在HVEM串联设施中安装了一台最先进的中压电子显微镜，其就地离子辐照能力与HVEM的能力相似。一台300千伏的日立H-9000 NAR已连接到该设施的两台离子加速器上，其成像空间分辨率比1970年代初的1.2 MV HVEM高出近一个数量级。HVEM仍然大量用于电子和离子辐照相关材料的研究，然而，特别是那些要求较低的显微镜是足够的。该IVEM和HVEM的能力和局限性进行了比较。HVEM和IVEM都是能源部资助的用户设施的一部分，因此可供科学界进行材料研究，免费进行非专有研究。
During 1995, a state-of-the-art intermediate voltage electron microscope (IVEM) has been installed in the HVEM-Tandem Facility with in situ ion irradiation capabilities similar to those of the HVEM. A 300 kV Hitachi H-9000NAR has been interfaced to the two ion accelerators of the Facility, with a spatial resolution for imaging which is nearly an order of magnitude better than that for the 1.2 MV HVEM which dates from the early 1970s. The HVEM remains heavily utilized for electron- and ion irradiation-related materials studies, nevertheless, especially those for which less demanding microscopy is adequate. The capabilities and limitations of this IVEM and HVEM are compared. Both the HVEM and IVEM are part of the DOE funded User Facility and therefore are available to the scientific community for materials studies, free of charge for non-proprietary research.