Suppression of hydrogenated carbon film deposition and hydrogen isotope retention by nitrogen addition into cold remote H/D and CH4 mixture plasmas
Suppression of hydrogenated carbon film deposition and hydrogen isotope retention by nitrogen addition into cold remote H/D and CH4 mixture plasmas
复制标题
通过向冷远程 H/D 和 CH4 混合等离子体中添加氮气来抑制氢化碳膜沉积和氢同位素保留
DOI：
10.1016/j.jnucmat.2015.01.017
复制
发表时间：
2015
影响因子：
3.1
通讯作者：
T. Ishijima
中科院分区：
文献类型：
--
作者：
K. Iida;A. Sasaki;M. Notani;Y. Uesugi;Y. Tanaka;T. Ishijima
未来聚变装置第一壁氚滞留和去除的控制是保证燃料安全和有效利用的关键问题之一。氮添加到远程边缘等离子体已被认为和测试作为一种有效的方法，用于抑制碳膜沉积和减少氢同位素吸收的沉积膜。本文利用小型螺旋装置研究了低温D_2/CH_4等离子体中注入氮气对氢化碳薄膜生长的清除作用。沉积结果表明，与碳氢化合物颗粒CD（H）x和C2 D（H）x相比，含CN和ND（H）键的反应性颗粒的生成要慢得多，这些反应性颗粒对碳氢化合物薄膜的生长和氢同位素的吸收具有抑制作用。这可能是由于氮原子缓慢扩散到氢化碳层中和氮吸收之间的化学平衡。
Control of tritium retention and its removal from the first wall of future fusion devices are one of the most crucial issues for safety and effective use for fuel. Nitrogen addition into remote edge plasmas has been considered and tested as an effective method for suppression of carbon film deposition and reduction of hydrogen isotope absorption in the deposited films. In this paper we have investigated the scavenger effects of nitrogen injected into low temperature D2/CH4plasmas on hydrogenated carbon film growth using a small helical device. The result of the deposition shows that the key reactive particles with CN and ND(H) bonds to suppression of hydrogenated carbon film growth and hydrogen isotope absorption are much slowly generated compared with hydrocarbon particles such as CD(H)xand C2D(H)x. This may be due to the slow atomic nitrogen diffusion into hydrogenated carbon layer and the chemical equilibrium between nitrogen absorption.