Electronic band structure of Ti2O3 thin films studied by angle-resolved photoemission spectroscopy
Electronic band structure of Ti2O3 thin films studied by angle-resolved photoemission spectroscopy
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角分辨光电子能谱研究 Ti2O3 薄膜的电子能带结构
DOI:
10.1103/physrevb.105.235137
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发表时间:
2022
影响因子:
3.7
通讯作者:
Kumigashira Hiroshi
中科院分区:
文献类型:
--
作者:
Hasegawa Naoto;Yoshimatsu Kohei;Shiga Daisuke;Kanda Tatsuhiko;Miyazaki Satoru;Kitamura Miho;Horiba Koji;Kumigashira Hiroshi
exhibits a unique metal-insulator transition (MIT) at ∼450 K over a wide temperature range of ∼150 K. This broad MIT accompanied by lattice deformation differs from the sharp MITs observed in most other transition-metal oxides. A longstanding issue is determining the role of electron-electron correlation in the electronic structure and MIT of. However, the lack of information about the band structure ofhas hindered investigating the origin of its unusual physical properties. Here, we report the electronic band structure of “insulating”films with slight hole doping by angle-resolved photoemission spectroscopy (ARPES). ARPES showed clear band dispersion on the surface of single-crystalline epitaxial films. The experimentally obtained band structures were compared with band-structure calculation results based on density functional theory (DFT) with generalized gradient approximation +correction. The obtained band structures are in good agreement with the DFT calculations at, suggesting that electron-electron correlation plays an important role in the electronic structure of. Furthermore, the detailed analyses with varyingsuggest that the origin of the characteristic MIT inis a semimetal-semimetal or semimetal-semiconductor transition caused by changes in the Fermi surface due to lattice deformation.