Chemical behavior of hydrogen isotopes into boronized film in LHD
Chemical behavior of hydrogen isotopes into boronized film in LHD
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DOI：
10.1016/j.jnucmat.2008.12.126
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发表时间：
2009-04
影响因子：
3.1
通讯作者：
A. Yoshikawa;Y. Kikuchi;T. Suda;N. Ashikawa;K. Nishimura;A. Sagara;N. Noda;Y. Oya;K. Okuno
中科院分区：
文献类型：
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作者：
A. Yoshikawa;Y. Kikuchi;T. Suda;N. Ashikawa;K. Nishimura;A. Sagara;N. Noda;Y. Oya;K. Okuno
在D-T聚变实验装置中，期望在硼化制备的硼膜中含有氧和碳作为杂质。通过对比静冈大学制备的P-CVD样品和LHD样品，研究了氢同位素注入NIFS LHD制备的硼膜的化学行为。LHD样品通过D2+注入形成B-D - b、B-D、B-C-D和B-O-D键。B-C - d键和B-O - d键主要由B-C键和B-O键与注入的D2+反应形成，D2+注入过程中碳氢化合物和水主要形成C-C键和游离氧。结果表明，LHD样品的总D保留量略大于P-CVD制备的含碳或含氧硼样品。这在很大程度上取决于碳氢化合物和水的碳-碳键和游离氧的数量。
In D-T fusion experimental devices, it is expected that oxygen and carbon could be contained as impurities in boron film produced by boronization. The chemical behavior of hydrogen isotopes implanted into boron films prepared in LHD at NIFS was studied by comparing the LHD sample with the P-CVD samples prepared at Shizuoka University. The LHD sample formed B–D–B, B–D, B–C–D and B–O–D bonds by D2+implantation. B–C–D and B–O–D bonds were mainly formed by the reaction of B–C and B–O bond with implanted D2+, and C–C bond and free oxygen were mainly formed the hydrocarbon and water during D2+implantation. It was suggested that the total D retention of the LHD sample was slightly larger than that of only the carbon- or oxygen-containing boron sample prepared by P-CVD. This could be largely affected to the amount of C–C bond and free oxygen which formed the hydrocarbon and water.