Hydroxyl defects and electrodiffusion (sweeping) in natural quartz crystals
Hydroxyl defects and electrodiffusion (sweeping) in natural quartz crystals
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天然石英晶体中的羟基缺陷和电扩散（扫描）
DOI：
10.1063/1.353952
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发表时间：
1993
期刊：
影响因子：
--
通讯作者：
H. Bahadur
中科院分区：
文献类型：
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作者：
H. Bahadur
对未扫描、钠扫描和氢扫描三种不同条件下的高、低氢天然结晶石英样品的低温近红外光谱进行了测试和分析。观察到的谱线被归结为五种缺陷类型：Al-OH−，碱影响的OH−，即Li-H和Na-H；诱导的H-扫掠；以及其他。对于高H和低H的样品，Al浓度和Al-OH−的生长比都在有限的范围内变化，而碱影响的OH−的变化范围更广。Al-Li+和Al-Na+缺陷浓度比的变化也在中等范围内。在高H和低H两种类型的石英中，生长的Al-Li+中心的强度变化很小，这表明天然石英晶体中的Al-OH−中心只有在达到一定的最大浓度后才会变得稳定。这反映了天然石英晶体生长机制的一个特征。
High‐ and low‐H samples of natural crystalline quartz in three different conditions, unswept, Na swept, and H swept, have been examined and analyzed for their low‐temperature near‐infrared spectra. The observed lines have been attributed to five defect types: Al‐OH−, alkali‐affected OH−, i.e., Li‐H and Na‐H; H‐sweeping induced; and others. For both high‐ and low‐H samples, the aluminum concentration and the grown‐in Al‐OH− ratios were found to vary over a limited range while those of alkali‐affected OH− were much wider. The variation in Al‐Li+ and Al‐Na+ defect concentration ratios was also over a moderate range. The very narrow variation in the strength of grown‐in Al‐Li+ centers in the two types of quartz, high‐ and low‐H, suggests that the Al‐OH− centers in natural quartz crystals become stable only after a certain maximum concentration of Al‐Li+ centers is reached. This reflects a characteristic feature of the growth mechanism of natural quartz crystals.