Effects of substrate temperature and heat treatment on GMR properties of Co-RE-O nano-granular films
Effects of substrate temperature and heat treatment on GMR properties of Co-RE-O nano-granular films
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DOI：
10.2320/matertrans1989.39.679
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发表时间：
1998-06-01
期刊：
影响因子：
--
通讯作者：
Fujimori, H
中科院分区：
文献类型：
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作者：
Kobayashi, N;Ohnuma, S;Fujimori, H
研究了衬底温度和退火对射频溅射法制备Co-RE-O （RE=Y, Nd, Sm, Gd, Tb, Dy）纳米颗粒膜巨磁电阻（GMR）的影响。薄膜由直径约为2 ~ 4 nm的金属颗粒和宽度约为0.5 ~ 1 nm的氧化物绝缘窄粒间组成。颗粒间通常以网络形式连接。在加热衬底上制备的纳米薄膜的GMR和场响应比在水冷衬底上制备的纳米薄膜大。GMR和场响应的增加可以解释为薄膜的磁化曲线随Co晶粒的生长和结构弛豫的变化。退火后薄膜结构几乎没有变化。纳米材料的GMR和保持响应没有通过退火得到改善。
Effects of substrate temperature and annealing on the giant magnetoresistance (GMR) of Co-RE-O (RE=Y, Nd, Sm, Gd, Tb, Dy) nano-granular films prepared by RF sputtering have been studied. The films consist of the metallic granules with the diameter of about 2-4 nm and oxide insulating narrow intergranules with the width of about 0.5-1 nm. The intergranule is generally connected as a network. The GMR and field response of a Nm prepared on a heated substrate are larger than those of a film prepared on a water-cooled substrate. The increases in GMR and its field response can be explained by the change in the magnetization curve of films with the growth of Co grains and the structure relaxation. The film structure is almost unchanged by annealing. The GMR and held response of the Nm are not improved by an annealing.