Improvement of Conductivity by incorporation of Boron atoms in Hydrogenated Amorphous Carbon Films fabricated by Plasma CVD methods and its Electrochemical Properties
Improvement of Conductivity by incorporation of Boron atoms in Hydrogenated Amorphous Carbon Films fabricated by Plasma CVD methods and its Electrochemical Properties
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等离子CVD法制备的氢化非晶碳薄膜掺入硼原子提高电导率及其电化学性能
DOI：
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发表时间：
2012
期刊：
影响因子：
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通讯作者：
Kensuke Honda
中科院分区：
文献类型：
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作者：
Hiroshi Naragino;Kosuke Yoshinaga;Seiji Tatsuta;Kensuke Honda
