Photochemistry and patterning of self-assembled monolayer films containing aromatic hydrocarbon functional groups
Photochemistry and patterning of self-assembled monolayer films containing aromatic hydrocarbon functional groups
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DOI：
10.1021/la9509514
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发表时间：
1996-03-20
期刊：
影响因子：
3.9
通讯作者：
Calvert, JM
中科院分区：
文献类型：
--
作者：
Dulcey, CS;Georger, JH;Calvert, JM
研究了R(CH2)(n) sio型（n = 0,1,2, R =苯基、萘基或蒽基）表面的化学吸附有机硅烷自组装膜的深紫外（λ <相似于250 nm）光化学性质。使用193和248 nm激光照射以及深紫外灯源进行光化学检测。结果表明，在多种体系中，包括单环、多环和杂环，主要的光化学机制是Si-C键的裂解。有机基团的光裂解产生极性的、可湿的硅醇表面，该表面可通过有机硅烷化学吸附进行随后的再修饰，从而允许在单个分子平面上制造高分辨率的化学官能团图案。在随后的选择性化学反应中，使用有图案的单层作为反应性模板被证明。
The deep ultraviolet (lambda < similar to 250 nm) photochemistry of chemisorbed organosilane self-assembled films of the type R(CH2)(n)SiO-surface where n = 0, 1, 2 and R = phenyl, naphthyl, or anthracenyl is explored. Photochemistry is examined using 193 and 248 nm laser irradiation as well as deep ultraviolet lamp sources. It is demonstrated for a variety of systems, including single and multiple rings as well as heterocycles, that the primary photochemical mechanism is cleavage of the Si-C bond. Photocleavage of the organic group generates a polar, wettable silanol surface that is amenable to subsequent remodification by organosilane chemisorption, allowing the fabrication of high-resolution patterns of chemical functional groups in a single molecular plane. The use of patterned monolayers as templates of reactivity for subsequent selective chemical reactions is demonstrated.