T. Kamiya, K. Nakahata, K. Ro, C. M. Fortmann, I. Shimizu: "High rates and very low temperature fabrication of polycrystalline silicon from fluorinated source gas and their transport properties"to be published in Mat. Res. Soc. Symp. Proc.. (1999)
T. Kamiya, K. Nakahata, K. Ro, C. M. Fortmann, I. Shimizu: "High rates and very low temperature fabrication of polycrystalline silicon from fluorinated source gas and their transport properties"to be published in Mat. Res. Soc. Symp. Proc.. (1999)
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T. Kamiya、K. Nakahata、K. Ro、C. M. Fortmann、I. Shimizu：“利用氟化源气体高速率和极低温制造多晶硅及其传输特性”，即将在 Mat 上发表。
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