Effects of bilayer thickness and post-deposition annealing on the mechanical and structural properties of (Ti,Cr,Al)N/(Al,Si)N multilayer coatings

Effects of bilayer thickness and post-deposition annealing on the mechanical and structural properties of (Ti,Cr,Al)N/(Al,Si)N multilayer coatings
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DOI:
10.1016/j.surfcoat.2008.11.002
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发表时间:
2009-02
影响因子:
5.4
通讯作者:
N. Fukumoto;H. Ezura;Kenji Yamamoto;A. Hotta;Tetsuya Suzuki
N. Fukumoto;H. Ezura;Kenji Yamamoto;A. Hotta;Tetsuya Suzuki
中科院分区:
材料科学1区
文献类型:
--
作者:
N. Fukumoto;H. Ezura;Kenji Yamamoto;A. Hotta;Tetsuya Suzuki

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制备了多层周期(λ)在10 ~ 60 nm之间的(Ti,Cr,Al)N/(Al,Si)N异质多层膜,研究了双层膜厚度和沉积后退火对多层膜力学性能和结构性能的影响。从X射线衍射结果中发现,对于所有多层周期,多层涂层具有(Ti,Cr,Al)N的立方晶体结构和(Al,Si)N的六方晶体结构。所有多层周期的涂层硬度均高于混合规则的计算值,且最小多层周期的涂层硬度最高。透射电子显微镜(TEM)观察证实,沉积涂层形成了尖锐的界面和均匀的多层结构,整个涂层。此外,对于硬度增加的涂层,在(Ti,Cr,Al)N和(Al,Si)N的界面处观察到六方相(Al,Si)N向立方相的部分转变。通过在800 - 1100 °C的温度范围内将涂层在真空炉中退火2 h来评价(Ti,Cr,Al)N/(Al,Si)N多层涂层的热稳定性。多层膜在高温退火后既没有形成新的晶体结构,也没有改变沉积态的晶体结构。即使在真空退火后也观察到均匀的多层结构,并且对于具有小周期的多层膜,硬度下降也被抑制。通过形成具有不互溶界面的多层结构获得了高的热稳定性。
Heterostructural (Ti,Cr,Al)N/(Al,Si)N multilayer coating with various multilayer periods (λ) between 10 and 60 nm was deposited and the effects of bilayer thickness and post-deposition annealing on the mechanical and structural properties of the coating were investigated. From the X-ray diffraction results, it was found that the multilayer coating had both crystal structures of cubic from (Ti,Cr,Al)N and hexagonal from (Al,Si)N for all multilayer periods. The hardness for all multilayer periods was higher than the calculated value from rule of mixture and the highest hardness was attained at the coating with the smallest multilayer period. Transmission electron microscopy (TEM) observation confirmed that deposited coatings formed a sharp interface and uniform multilayer structure throughout the coating. In addition, for coating that showed hardness increase, partial transformation of hexagonal (Al,Si)N to cubic phase was observed at the interface of (Ti,Cr,Al)N and (Al,Si)N. The thermal stability of the (Ti,Cr,Al)N/(Al,Si)N multilayer coating was evaluated by annealing the coatings in vacuum furnace for 2 h at temperatures ranging from 800 to 1100 °C. The multilayer coatings did not form a new crystal structure nor transform its as-deposited crystal structure after high temperature annealing. Uniform multilayer structure was observed even after vacuum annealing and the hardness drop was also suppressed for multilayer coatings with small periods. High thermal stability was attained by forming a multilayer structure with immiscible interface.