Improving oxidation and wear resistance of TiB2 films by nano-multilayering with Cr
Improving oxidation and wear resistance of TiB2 films by nano-multilayering with Cr
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Cr纳米多层膜提高TiB2薄膜的抗氧化性和耐磨性
DOI：
10.1016/j.surfcoat.2022.128337
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发表时间：
2022-03
影响因子：
5.4
通讯作者：
Grzegorz Greczynski
中科院分区：
文献类型：
--
作者：
Zhengtao Wu;Rongli Ye;Babak Bakhit;Ivan Petrov;Lars Hultman;Grzegorz Greczynski
交替的TiB 2-DCMS和Cr-HiPIMS层用于制造TiB 2/Cr多层膜，其中改变Cr中间层厚度（2和5 nm），以及Cr中间层从浮置到-60 V和-200 V生长期间的衬底偏压。研究了多层膜结构对TiB 2/Cr多层膜力学性能、静态氧化性能和摩擦学性能的影响。结果表明，TiB 2纳米柱在Cr界面处重新成核，保持了薄膜表面的光滑性和薄膜的致密性。与TiB 2单层相比，用厚度为2-5 nm的Cr夹层改善了在500-600 °C下的抗氧化性。Cr中间层的厚度从2 nm增加到5 nm，多层膜的硬度略有下降，但磨损率显着恶化。由于表面氧化引起的硼酸液体润滑，500 °C下的摩擦系数低于RT下的摩擦系数。TiB 2/Cr多层膜比TiB 2单层膜具有更高的耐磨性。在-60 V电压下沉积的2 nm厚的Cr多层膜具有最低的磨损率。用200 eV Cr+辐照导致界面混合，导致形成缺B TiBx相（x< 2），与−60 V下生长的多层膜相比，磨损率更高。
Alternating TiB2-DCMS and Cr-HiPIMS layers are used to fabricate TiB2/Cr multilayer films with varying the Cr interlayer thickness, 2 and 5 nm, and the substrate bias during growth of Cr interlayers from floating, to −60 V and −200 V. The effects of multilayer structure on mechanical properties, static oxidation, and tribological behavior of the TiB2/Cr multilayers are investigated. The results reveal that TiB2nanocolumns renucleate at each Cr interface maintaining smooth film surface and film density. Interlaying with Cr with thicknesses of 2–5 nm improves the resistance to oxidation at 500–600 °C as compared to TiB2monolayer. The increase of the thickness of the Cr interlayers from 2 to 5 nm decreases the hardness of the multilayer slightly but deteriorates the wear rate significantly. The friction coefficients at 500 °C are lower than those at RT due to boric acid liquid lubrication induced by surface oxidation. The TiB2/Cr multilayer films show higher wear resistance than TiB2monolayer. The multilayer films with 2 nm-thick Cr deposited at −60 V have the lowest recorded wear rates. Irradiation with 200 eV Cr+leads to interface mixing, resulting in the formation of B-deficient TiBxphase (x< 2) and higher wear rates compared to multilayers grown at −60 V.
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影响因子：
2.8
作者：
M. Berger;M. Larsson
通讯作者：
M. Berger;M. Larsson
影响因子：
5
作者：
R. Zeebe
通讯作者：
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影响因子：
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作者：
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M. Polyakov;M. Morstein;X. Maeder;T. Nelis;D. Lundin;J. Wehrs;J. Best;T. Edwards;M. Döbeli;J. Michler
影响因子：
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作者：
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通讯作者：
Szymanski, W.
影响因子：
6.7
作者：
Greczynski, G.;Hultman, L.
通讯作者：
Hultman, L.