Al2O3-Y2O3 nanolaminated slab optical waveguides by atomic layer deposition
Al2O3-Y2O3 nanolaminated slab optical waveguides by atomic layer deposition
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DOI：
10.1016/j.optmat.2020.109822
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发表时间：
2020-05
影响因子：
3.9
通讯作者：
E. G. Lizarraga-Medina;D. L. C. –. Espitia;J. Gonzalez;J. López;H. Marquez;O. López;H. Tiznado
中科院分区：
文献类型：
--
作者：
E. G. Lizarraga-Medina;D. L. C. –. Espitia;J. Gonzalez;J. López;H. Marquez;O. López;H. Tiznado
原子层沉积 (ALD) 是一种共形、均质且均匀的技术，是光波导的理想特性。最近的研究证明，ALD 的优点往往是减少亚微米波导中的光学损耗。 Al2O3 和 Y2O3 被称为在可见光-近红外区域具有透明特性的光学材料，可用于传感器和电信领域。在这项工作中，通过热 ALD 在 250 °C 下生长的 Al2O3-Y2O3 纳米层压薄膜被用作板条波导的核心。使用不同比例的 Y2O3，将纳米层压板的总厚度设置为 500 nm。通过椭圆偏振光谱仪估算材料的折射率，通过棱镜耦合确定 632.8 nm 波导的有效折射率，并测量光纤到波导耦合装置的传播损耗系数。通过扫描电子显微镜（SEM）和透射电子显微镜（TEM）对样品进行微量分析。所有样品的传播均在 632.8 nm 处进行了证明。
Atomic layer deposition (ALD) is a conformal, homogeneous and uniform technique, ideal characteristics for optical waveguides. Recent investigations prove that the advantages of ALD tend to reduce optical losses in submicron waveguides. Al2O3and Y2O3are known as optical materials with transparency characteristics in the visible-NIR region, which allow application sensors and telecommunications. In this work, Al2O3-Y2O3nanolaminates films grown at 250 °C by thermal ALD were used as core for slab waveguides. Different proportions of Y2O3were used, setting the total nanolaminate thickness at 500 nm. Refractive index of materials was estimated by Spectroscopic Ellipsometry, effective refractive index of waveguides at 632.8 nm was determined by prism coupling, and propagation loss coefficient were measured for a fiber-to-waveguide coupling setup. Microanalysis of samples was made by means of Scanning Electron Microscopy (SEM) and Transmission Electron Microscopy (TEM). Propagation of all samples was demonstrated at 632.8 nm.