Theory for the ultrafast ablation of graphite films
Theory for the ultrafast ablation of graphite films
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DOI：
10.1103/physrevlett.87.015003
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发表时间：
2001-07-02
影响因子：
8.6
通讯作者：
Bennemann, KH
中科院分区：
文献类型：
--
作者：
Jeschke, HO;Garcia, ME;Bennemann, KH
使用微观电子理论分析了飞秒激光脉冲引起石墨膜损伤形成的物理机制。我们通过对时间相关的势能表面进行分子动力学模拟来描述电子和晶格的非平衡动力学。我们证明石墨具有表现出两种不同的激光诱导结构不稳定性的独特性质。对于高吸收能量（>3.3 eV/原子），我们发现非平衡熔化随后快速蒸发。对于高于损伤阈值（>2.0 eV/原子）的低强度，通过去除完整的石墨片来发生烧蚀。
The physical mechanisms for damage formation in graphite films induced by femtosecond laser pulses are analyzed using a microscopic electronic theory. We describe the nonequilibrium dynamics of electrons and lattice by performing molecular dynamics simulations on time-dependent potential energy surfaces. We show that graphite has the unique property of exhibiting two distinct laser-induced structural instabilities. For high absorbed energies (>3.3 eV/atom) we find nonequilibrium melting followed by fast evaporation. For low intensities above the damage threshold (>2.0 eV/atom) ablation occurs via removal of intact graphite sheets.