Continuous electropolishing technique for long-length Hastelloy C-276 tape
Continuous electropolishing technique for long-length Hastelloy C-276 tape
复制标题
长长度哈氏合金 C-276 胶带连续电解抛光技术
DOI：
10.1007/s12598-018-1106-y
复制
发表时间：
2018-09-01
期刊：
影响因子：
8.8
通讯作者：
Ma, Lin
中科院分区：
文献类型：
--
作者：
Hao, Shan-Peng;Wang, Yi;Ma, Lin
通过离子束辅助沉积（IBAD）制备第二代高温超导带材需要平坦的金属基底。本工作对长条哈氏C-276合金的电化学抛光进行了研究，并对其工艺参数、表征粗糙度等性能进行了研究。通过电化学抛光制备了10米长的Hastelloy C-276合金。获得了以下优化工艺参数：温度45℃，电流密度0.439A·cm−2，抛光时间60s。通过原子力显微镜表征，表面平均粗糙度值（Ra）小于5 nm（5 μm × 5 μm）。该数值满足了IBAD技术路线进一步制备过渡层对的要求。
Preparation of the second-generation high-temperature superconducting tape by ion beam-assisted deposition (IBAD) requires a flat metal substrate. In this work, the electrochemical polishing of long-length Hastelloy C-276 alloy was studied, and its process parameters, characterized roughness and other properties were investigated. A 10-meter-long Hastelloy C-276 alloy was prepared by electrochemical polishing. The following optimized processing parameters are obtained: temperature of 45 °C, current density of 0.439 A·cm−2and polishing time of 60 s. The average roughness value (Ra) of the surface is less than 5 nm (5 μm × 5 μm), which was characterized by atomic force microscopy. This value satisfies the requirements for the further preparation of transition-layer pair by the IBAD technology route.