High-Yield Production of Highly Fluorinated Graphene by Direct Heating Fluorination of Graphene-oxide
High-Yield Production of Highly Fluorinated Graphene by Direct Heating Fluorination of Graphene-oxide
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DOI：
10.1021/am402958p
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发表时间：
2013-09-11
影响因子：
9.5
通讯作者：
Liu, Xiangyang
中科院分区：
文献类型：
--
作者：
Wang, Xu;Dai, Yunyang;Liu, Xiangyang
通过采用具有大表面积的蜂窝状GO作为起始材料并使用元素氟，我们开发了一种新颖、简单的拓扑路线，在低温下大量制备高度氟化的石墨烯。 F/C摩尔比值接近1.02。得到了少层氟化石墨烯片，其中单层氟化石墨烯片的产率约为10%，层数主要在2-5层。探索了氟化石墨烯的形态和化学结构的变化，并报告了一些物理性质。
By employing honeycomb GO with large surface area as the starting materials and using elemental fluorine, we developed a novel, straightforward topotactic route toward highly fluorinated graphene in really large quantities at low temperature. The value of F/C molar ratio approaches to 1.02. Few-layer fluorinated graphene sheets are obtained, among which the yield of monolayered FG sheet is about 10% and the number of layers is mainly in the range of 2-5. Variations in morphology and chemical structure of fluorinated graphene were explored, and some physical properties were reported.