Intense sub-micrometre focusing of soft X-ray free-electron laser beyond 1016 Wcm-2 with an ellipsoidal mirror
Intense sub-micrometre focusing of soft X-ray free-electron laser beyond 1016 Wcm-2 with an ellipsoidal mirror
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DOI：
10.1107/s1600577519007057
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发表时间：
2019-09-01
影响因子：
2.5
通讯作者：
Mimura, Hidekazu
中科院分区：
文献类型：
--
作者：
Motoyama, Hiroto;Owada, Shigeki;Mimura, Hidekazu
利用高数值孔径椭球镜实现了软x射线自由电子激光器的亚微米强聚焦。采用混合聚焦系统与Kirkpatrick-Baez反射镜相结合，补偿椭球面反射镜的小空间接收。利用该系统，在光子能量为120eV的情况下，以8.8x10(16)Wcm（-2）的超高强度将软x射线FEL脉冲聚焦至480nm × 680nm，在Si的l边（99.8eV）产生饱和吸收，透射率从8%急剧增加到48%。
Intense sub-micrometre focusing of a soft X-ray free-electron laser (FEL) was achieved by using an ellipsoidal mirror with a high numerical aperture. A hybrid focusing system in combination with a Kirkpatrick-Baez mirror was applied for compensation of a small spatial acceptance of the ellipsoidal mirror. With this system, the soft X-ray FEL pulses were focused down to 480nm x 680nm with an extremely high intensity of 8.8x10(16)Wcm(-2) at a photon energy of 120eV, which yielded saturable absorption at the L-edge of Si (99.8eV) with a drastic increase of transmittance from 8% to 48%.