Characterization of a 100-nm 1D pitch standard by metrological SEM and SFM

Characterization of a 100-nm 1D pitch standard by metrological SEM and SFM
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通过计量 SEM 和 SFM 表征 100 nm 1D 间距标准

DOI:
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发表时间:
2004
期刊:
SPIE Advanced Lithography
影响因子:
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通讯作者:
J. Prochazka
J. Prochazka
中科院分区:
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文献类型:
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作者:
W. Haessler;T. Dziomba;C. G. Frase;H. Bosse;J. Prochazka

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我们报告的调查,包括校准的100 nm间距的结构,NanoLattice的超大规模集成电路标准,用一个特殊的扫描电子显微镜(SEM)和扫描力显微镜(SFM)。所使用的SEM被称为电子光学计量系统(EOMS),基本上由一个专用的低电压电子束柱组成,该柱安装在一个大型真空室的顶部,该真空室具有一个集成的激光控制精密2D平台。该仪器的主要特点是将真空激光干涉测量的亚nm分辨率物体位置测量与约5-10 nm的高分辨率电子束探针相结合的联合收割机。结合激光干涉仪和二次电子强度分布数据的相关方法被用来分析全局间距以及局部间距偏差。EOMS测量证实了良好的间距均匀性。初步估计产生的亚纳米平均间距的不确定性为100 nm的光栅周期在整个有效面积为1 mm x 1.2 mm。额外的SFM调查进行了修改后的NanoStation III(SIS有限公司,德国)已特别适用于高稳定性测量。以这种方式,该仪器允许以高再现性确定结构的间距均匀性和线边缘粗糙度(LER)。初步结果表明,与EOMS测量的良好协议。
We report on investigations including calibration of a 100 nm pitch structure, the NanoLattice by VLSI Standards, with a special metrological scanning electron microscope (SEM) and a scanning force microscope (SFM). The SEM used is called electron optical metrology system (EOMS) and basically consists of a dedicated low voltage e-beam column which is mounted on top of a large vacuum chamber with an integrated, laser-controlled precision 2D stage. The key feature of this instrument is the advantage to combine sub-nm-resolution object position measurement by vacuum laser interferometry with a high resolution e-beam probe of about 5-10 nm. Correlation methods combining the laser interferometer and secondary electron intensity profile data are used to analyze global pitch as well as local pitch deviations. The EOMS measurements confirm an excellent pitch uniformity. Preliminary estimations yield sub-nanometric mean pitch uncertainties for the 100 nm grating period over the whole active area of 1 mm x 1.2 mm. Additional SFM investigations were performed by a modified NanoStation III (SIS GmbH, Germany) which has been especially adapted for high stability measurements. In this way, the instrument allows to determine pitch homogeneity and line edge roughness (LER) of the structures with high reproducibility. Preliminary results show a good agreement with EOMS measurements.