Influence of silane partial pressure on the properties of amorphous SiCN films prepared by ECR-CVD
Influence of silane partial pressure on the properties of amorphous SiCN films prepared by ECR-CVD
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DOI:
10.1016/s0040-6090(00)01277-3
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发表时间:
2000-12
期刊:
影响因子:
2.1
通讯作者:
D. Zhang;Y. Gao;Jun Wei;Z. Mo
中科院分区:
文献类型:
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作者:
D. Zhang;Y. Gao;Jun Wei;Z. Mo