Structural Estimation and Hazard Evaluation of Potentially Explosive Residual Silanes Generated in Semiconductor Manufacturing Processes
Structural Estimation and Hazard Evaluation of Potentially Explosive Residual Silanes Generated in Semiconductor Manufacturing Processes
复制标题
半导体制造过程中产生的潜在爆炸性残留硅烷的结构估计和危害评估
DOI：
10.1021/acs.iecr.1c05007
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发表时间：
2022
影响因子：
4.2
通讯作者：
H. Fukui
中科院分区：
文献类型：
--
作者：
K. Uchida;I. Uematsu;T. Iwamoto;E. Kwon;S. Yoshida;R. Kato;H. Fukui
我们提出了一个方案，分析潜在的爆炸性残留硅烷（RS）在硅基半导体制造工艺中产生的四日市工厂，Kioxia公司，适当的惰性气体气氛下。热分析和弹道迫击炮试验表明，不完全水解的RS构成最高的风险。质谱表明RS主要成分的可能结构是硅原子数小于16的环状聚氯硅烷。结合仪器分析和理论计算表明，RS的水解产物涉及Si-OH，Si-O-Si和Si-Si部分。理论计算预测了模型化合物（HO）H2Si-SiH 2（OH）形成羟基硅氧烷和H2的实质性放能过程。
We have proposed a scheme to analyze potentially explosive residual silanes (RS) generated in silicon-based semiconductor manufacturing processes in the Yokkaichi Plant, Kioxia Corporation, properly under an inert gas atmosphere. Thermal analysis and ballistic mortar tests revealed that the incomplete hydrolyzed RS poses the highest risk. The mass spectrum suggests that the possible structures of the major components of the RS are cyclic polychlorosilanes with the number of silicon atoms less than 16. A combination of instrumental analyses and theoretical calculations suggest that the hydrolyzed products of the RS involve Si–OH, Si–O–Si, and Si–Si moieties. Theoretical calculations predicted the substantial exergonic processes of a model compound (HO)H2Si–SiH2(OH) to form a hydroxylsiloxane and H2.