Nanostructured plasma etched, magnetron sputtered nanolaminar Cr2AlC MAX phase thin films
Nanostructured plasma etched, magnetron sputtered nanolaminar Cr2AlC MAX phase thin films
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DOI：
10.1016/j.apsusc.2013.12.099
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发表时间：
2014-02-15
影响因子：
6.7
通讯作者：
Schaaf, Peter
中科院分区：
文献类型：
--
作者：
Grieseler, Rolf;Haehnlein, Bernd;Schaaf, Peter
对新材料机械性能的了解本质上决定了它们在微米和纳米结构中使用时的可用性和功能性。由于其独特的材料特性组合，MAX 相是一种非常有趣的新型材料。本文提出了一种生产 Cr2AlC MAX 相的新方法。薄膜元素多层沉积和随后的快速热退火在几秒钟内形成 MAX 相。此外，基于该 MAX 相薄膜的独立式微结构（梁和悬臂）是通过等离子蚀刻制备的。研究了这些 MAX 相微观结构的机械性能。 (C) 2013 Elsevier B.V. 保留所有权利。
The knowledge of the mechanical properties of new materials determines essentially their usability and functionality when used in micro- and nanostructures. MAX phases are new and highly interesting materials due to their unique combination of materials properties. In this article a new method for producing the Cr2AlC MAX phase is presented. Thin film elemental multilayer deposition and subsequent rapid thermal annealing forms the MAX phase within seconds. Additionally, free standing microstructures (beams and cantilevers) based on this MAX phase films are prepared by plasma etching. The mechanical properties of these MAX phase microstructures are investigated. (C) 2013 Elsevier B.V. All rights reserved.