Extremely Uniform and Highly Efficient Plasma‐Discharge Sources by using Transfer Mold Micro‐Projection Cathode Arrays for Large area and Flat‐Type Ultra‐Violet Lighting Applications
Extremely Uniform and Highly Efficient Plasma‐Discharge Sources by using Transfer Mold Micro‐Projection Cathode Arrays for Large area and Flat‐Type Ultra‐Violet Lighting Applications
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使用传递模微投影阴极阵列实现极其均匀和高效的等离子放电源，用于大面积和平面型紫外线照明应用
DOI：
10.1002/sdtp.14437
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发表时间：
2021
期刊：
影响因子：
--
通讯作者：
Moon Jonghyun
中科院分区：
文献类型：
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作者：
Nakamoto Masayuki;Moon Jonghyun
采用传统介质阻挡放电技术，在常压区利用高压等离子体放电源产生无汞紫外光源。然而，在典型峰对峰幅为1.5-6 kV的交流电压条件下，具有传统扁平型电极和同轴型电极的介质阻挡放电装置会因高放电启动电压和异常放电引起的二次离子轰击而发生雪崩和电极变形而退化。在本研究中，转移模微投影阴极阵列具有非常均匀和锋利的尖端，通过增强阴极阵列上的局部电场浓度，可以预期在高压下的低放电启动电压。采用转移模场发射阵列（FEAs）制造方法制备了这些转移模微投影阴极阵列，并对其放电特性进行了评估，作为UV照明应用的第一步。转移模微投影阴极阵列可用于具有低击穿电压的极其均匀的等离子体源应用，然后有望在很大程度上应用于大面积和平板型紫外照明应用。
Mercury‐free ultra‐violet light source, which were generated by high pressure plasma discharge sources in the atmospheric pressure region, have been proposed by using conventional dielectric barrier discharge. However, dielectric barrier discharge devices having conventional flat‐type electrodes as well as coaxial‐type electrodes, would be degraded by the avalanche and the deformation of electrode due to the secondary ion bombardment by high discharge‐starting voltages and abnormal discharges, under the conditions of ac voltages with typical peak‐to‐peak amplitudes of 1.5–6 kV. In this study, low dischargestarting voltage under high pressure can be expected by the enhancement of the local electric field concentration on cathode arrays having extremely uniform and sharp tips of Transfer Mold micro‐projection cathode arrays. These Transfer Mold microprojection cathode arrays have been fabricated by using Transfer Mold field emitter arrays (FEAs) fabrication method and evaluated for discharge characteristics as the first step for UV lighting applications. Transfer Mold micro‐projection cathode arrays can be useful for the extremely uniform plasma source applications having the low breakdown voltage, then expected to be applied to large area and flat‐type UV lighting applications to a great extent.